Friday December 04, 2015

Intel Receives 2016 IEEE Corporate Innovation Award

The Institute of Electrical and Electronics Engineers (IEEE) is awarding Intel its 2016 IEEE Corporate Innovation Award for "pioneering the use of high-k metal gate and tri-gate transistor technologies in high-volume manufacturing." Intel was the first to design, develop and manufacture products at high-volume using high-k and tri-gate (or FinFET) technologies. These innovations made it possible to continue scaling transistors ever smaller with lower cost-per-transistor, improved performance and lower power consumption آ– keeping Moore's Law going.